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Article – Journal of Nanoscience and Technology

Journal of Nanoscience and Technology, Volume 5,Issue 4,2019 Pages 773-775


Optimization of Growth Parameters for Deposition of Cd1-xMnxS (x=0.4) Nanocrystalline Thin Films by Chemical Bath Deposition Technique
A.E. Mali*, S.V. Borase, A.S. Gaikwad

https://doi.org/10.30799/jnst.262.19050408

The growth and study of Cd1-xMnxS (x = 0.4) nanocrystalline thin films on glass substrate using chemical bath deposition techniques with the Mn doping has been presented. We report the film deposition and optimization of the growth parameters that maximizes the thickness of the deposited film in alkaline solutions. The preparative parameters such as bath temperature, deposition time, pH, precursor concentration etc. were optimized to get good quality films. The deposited film showed an optical transmittance of about 80% with band gap 2.81 eV for a molar composition of x=0.4. The film thickness was found decreased with increase in Mn2+ concentration. Further, deposited films were characterized by using UV-visible spectrophotometer. The film thickness was estimated using gravimetric weight difference method. The composition of the films was estimated by using EDAX and surface morphology was studied by using FESEM characterizations.



Keywords: CdMnS; Ternary Films; Chemical Bath Deposition (CBD);